Solutions · Semiconductors

Take only the lead resist candidate to the fab.

Award winner, 2nd place worldwide, GIC 2026 Advanced Materials track (Mitsubishi Chemical Group × AIST) for an industrial EUV photoresist; the challenge method’s compute cut from 173 GPU-hours to minutes.

Judged result · classical computation

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Semiconductors · materialsQuantum hardware · Simulation

Pick the winning EUV photoresist before the fab

Resist candidates ranked before any were made, so only the lead goes to synthesis and wafer testing. Award winner, 2nd place worldwide, GIC 2026 Advanced Materials track (Mitsubishi Chemical Group × AIST).

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